설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Applied Producer GT is the industry’s fastest, most cost-effective 300mm CVD platform. Capable of processing 180wph within a very compact footprint, the Producer GT achieves twice the throughput density of any competitive system. Built on the highly successful Producer system, this new platform provides customers with complete process transparency for the full range of PECVD applications for 45nm and beyond while delivering 50% higher system throughput.To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.문서
문서 없음
APPLIED MATERIALS (AMAT)
PRODUCER GT CHAMBER
검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
104708
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
PRODUCER GT CHAMBER
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
104708
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Applied Producer GT is the industry’s fastest, most cost-effective 300mm CVD platform. Capable of processing 180wph within a very compact footprint, the Producer GT achieves twice the throughput density of any competitive system. Built on the highly successful Producer system, this new platform provides customers with complete process transparency for the full range of PECVD applications for 45nm and beyond while delivering 50% higher system throughput.To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.문서
문서 없음