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Technology: DCVD Mainframe Type: Producer SE Wafer Shape: SNNF Chamber Type/Location Chamber Type: SACVD Process Twin Chamber Location: Chamber A: SACVD Process Twin chamber Chamber B: SACVD Process Twin chamber Chamber C: Empty Electrical Configuration Voltage: 208V 3Phase 4Wires Frequency: 50/60 Hz Full load Current: 240 Amperes System Safety System Labels: English EMO Type: Turn to release General Mainframe Chamber Slit Valve: G67P Wafer in pocket sensor : Standard Buffer Robot Type : VHP robot VHP robot Driver: 0190-24962 NSK driver(ELA-B014CG7-04) VHP robot blade: 0200-06112 BLADE, CERAMIC, 300MM PRODUCER SE Factory Interface Options Load Port Types : TDK Load Port 02TF12718 (0190-16691) FI Robot Robot Type: ROBOT AA, KAWASAKI PRODUCER FI 300MM(0190-10301) Robot Driver: Kawasaki 30C61C-B004 Master A Robot Controller (0190-12379) Metrology Unit: None Ionizing System: E78 Ionizer Chamber Configuration Chamber Process : Chamber A--- SACVD BPSG Chamber B--- SACVD BPSG RF Generator: None End point detector: NA Process kits: Blocker Plate: 0021-25474 Faceplate: 0041-13896 GAS box: 0040-53688 LINER, CERAMIC MIDDLE, PMD SACVD 300MM : 0200-02525 PUMPING RING, PMD ETERNA, PRODUCER SE: 0020-31178 LINER, CERAMIC BOTTOM, SACVD 300MM PRODUCER: 0200-00668 Liner Ceramic Top Eterna: 0200-02414 ISOLATOR, CERAMIC, 300MM Producer : 0200-04235 300mm AMAT Producer Ceramic Heater: 0040-85475 Chamber Clean Method: Remote Plasma (RPS) Clean: (0920-00057) MKS F180131, ASTRON ex Remote Plasma source Gauge/ Monometer Configuration: 20Torr / 1000Torr with 100 Torr 1/2 ATM Switch Pressure Control: Throttle valve Type: 3870-03394MKS Throttle Valve 683B-23795, Type 683 Control Valve Forline Valve: 3870-03322 VALVE GATE 3" ID NW57 PNEU N/C W/O POSIT Gas Delivery Options Gas Delivery Gas Pallet Type: Surface Mount Vertical Regulated Gas Panel Gas Feed :Top Gas Panel Cabinet Exhaust: Top Exhaust MFC Type: Unit UFC-8565 Gas Pallet Configuration Supplement Chamber A: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2 Chamber B: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2 Remotes Options System Monitors : Local Monitors Standalone with 1st and 2nd monitors Ozonator Rack : Ozone Generator Rack with Astex 8407 O3 generator Heat Exchanger/Chiller: Option Remote AC : Facilities UPS InterfaceOEM 모델 설명
The Applied Materials PRODUCER SE is a chemical vapor deposition (CVD) system manufactured by Applied Materials, Inc. It is designed for depositing thin films onto semiconductor wafers in the semiconductor manufacturing process.문서
APPLIED MATERIALS (AMAT)
PRODUCER SE
검증됨
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
107902
웨이퍼 사이즈:
12"/300mm
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
PRODUCER SE
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
107902
웨이퍼 사이즈:
12"/300mm
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available