설명
Plasmalab 100+RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, 2ea Adixen ACT 600M turbopump controller. Leybold D65BCS vacuum pump w/ oil filter & exhaust filter; BOC Edwards XDS10 scroll vacuum pump; Thermo Neslab RTE 740 chiller, BOM# 274103200000; gas box; control computer (no HDD) & LCD monitor. 64in x 29in x 49in H.환경 설정
환경 설정 없음OEM 모델 설명
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces문서
문서 없음
카테고리
PECVD
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
135812
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
OXFORD
PLASMALAB 100
카테고리
PECVD
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
135812
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Plasmalab 100+RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, 2ea Adixen ACT 600M turbopump controller. Leybold D65BCS vacuum pump w/ oil filter & exhaust filter; BOC Edwards XDS10 scroll vacuum pump; Thermo Neslab RTE 740 chiller, BOM# 274103200000; gas box; control computer (no HDD) & LCD monitor. 64in x 29in x 49in H.환경 설정
환경 설정 없음OEM 모델 설명
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces문서
문서 없음