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설명
Overhaul done System Condition : working state (dismantled and packed)환경 설정
Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8OEM 모델 설명
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces문서
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
112074
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
OXFORD
PLASMALAB 100
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
112074
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available