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OXFORD PLASMALAB 100
    설명
    Overhaul done System Condition : working state (dismantled and packed)
    환경 설정
    Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
    OEM 모델 설명
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    문서

    OXFORD

    PLASMALAB 100

    verified-listing-icon

    검증됨

    카테고리
    PECVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    112074


    웨이퍼 사이즈:

    6"/150mm, 8"/200mm


    빈티지:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD
    빈티지: 0조건: 중고
    마지막 검증일15일 전

    OXFORD

    PLASMALAB 100

    verified-listing-icon
    검증됨
    카테고리
    PECVD
    마지막 검증일: 60일 이상 전
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/9d260e74ef324c95ac19626371e0c51b_pecvdicprieoxfordplasmasystem100page04image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/ed933e16946740b3b88d3a787bf4425b_pecvdicprieoxfordplasmasystem100page06image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/4b1929a0e9d447748e0d922c0c5deb50_pecvdicprieoxfordplasmasystem100page08image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/786a902c042b4149b021dab7abd98f82_pecvdicprieoxfordplasmasystem100page02image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/7562b60e3d424ca29ff0eb9108fadab4_pecvdicprieoxfordplasmasystem100page03image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/fae6286f239b4bdd950f7209f02a4fc1_pecvdicprieoxfordplasmasystem100page07image0001_mw.jpg
    listing-photo-63732c1d1ea244bfbfd9edc0d4d5b510-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73731/63732c1d1ea244bfbfd9edc0d4d5b510/7e8afa5519e84cc085a4cb3a3ec7b90b_pecvdicprieoxfordplasmasystem100page05image0001_mw.jpg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    112074


    웨이퍼 사이즈:

    6"/150mm, 8"/200mm


    빈티지:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Overhaul done System Condition : working state (dismantled and packed)
    환경 설정
    Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8
    OEM 모델 설명
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    문서
    유사 등재물
    모두 보기
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD빈티지: 0조건: 중고마지막 검증일:15일 전
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD빈티지: 0조건: 중고마지막 검증일:6일 전