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OXFORD PLASMALAB 800 PLUS
    설명
    Reactive Ion Etching Machine Frequency: 50/60HZ Voltage: 415VAC 3PHASE Full Load Amps:25.6Amps Machine Main Breaker Rating:32Amps Ampere Rating Of Largest Load:20Amps Interupt Current:4500 A.I.C Configuration: Nitride and Oxide Deposition Batch process tool, 18" platen  RF Components: ENI:  ACG - 5 XL , RF generator, 13.56MHZ, 500W ENI:  LPG - 6A , RF generator, 90kHz to 460kHz, 600W ATX-600 impedence matching network 450mm Platen with 300°C+ heater Windows PC , user friendly interface Gas pod with 6 lines including following MFCs: N2 – 1000sccm N2O – 100sccm N2O – 2000sccm NH3 – 100sccm SiH4 – 2000sccm  Gases Previously Used were the Following:  N2O , N2, NH3, SiH4  The tool is compact and very simple for operation. Footprint is 36"W x 42"D x 54" H. The chamber is on the top. The power supply, etc. are in the front and accessible behind a stainless steel panel. There is no load lock. You open the chamber, load one or more 4" substrates, close the chamber, and start the chamber pump down. Once the desired vacuum level is achieved, It is ready to run deposition process.
    환경 설정
    Reactive Ion Etching Machine
    OEM 모델 설명
    The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.
    문서
    verified-listing-icon

    검증됨

    카테고리
    PECVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Installed / Idle


    제품 ID:

    131557


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD
    빈티지: 0조건: 중고
    마지막 검증일30일 이상 전

    OXFORD

    PLASMALAB 800 PLUS

    verified-listing-icon
    검증됨
    카테고리
    PECVD
    마지막 검증일: 60일 이상 전
    listing-photo-599564fdc23e45339a0e944218345ba7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/89425/131557/8e7eaabe40ff4fe9ab51d973e93bbcbb_c4080b1ce57848f2bb4408d05b25863519_mw.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Installed / Idle


    제품 ID:

    131557


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Reactive Ion Etching Machine Frequency: 50/60HZ Voltage: 415VAC 3PHASE Full Load Amps:25.6Amps Machine Main Breaker Rating:32Amps Ampere Rating Of Largest Load:20Amps Interupt Current:4500 A.I.C Configuration: Nitride and Oxide Deposition Batch process tool, 18" platen  RF Components: ENI:  ACG - 5 XL , RF generator, 13.56MHZ, 500W ENI:  LPG - 6A , RF generator, 90kHz to 460kHz, 600W ATX-600 impedence matching network 450mm Platen with 300°C+ heater Windows PC , user friendly interface Gas pod with 6 lines including following MFCs: N2 – 1000sccm N2O – 100sccm N2O – 2000sccm NH3 – 100sccm SiH4 – 2000sccm  Gases Previously Used were the Following:  N2O , N2, NH3, SiH4  The tool is compact and very simple for operation. Footprint is 36"W x 42"D x 54" H. The chamber is on the top. The power supply, etc. are in the front and accessible behind a stainless steel panel. There is no load lock. You open the chamber, load one or more 4" substrates, close the chamber, and start the chamber pump down. Once the desired vacuum level is achieved, It is ready to run deposition process.
    환경 설정
    Reactive Ion Etching Machine
    OEM 모델 설명
    The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.
    문서
    유사 등재물
    모두 보기
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD빈티지: 0조건: 중고마지막 검증일:30일 이상 전
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD빈티지: 1998조건: 중고마지막 검증일:60일 이상 전
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD빈티지: 2011조건: 중고마지막 검증일:30일 이상 전