We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
설명 없음환경 설정
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 모델 설명
미제공문서
문서 없음
카테고리
PECVD
마지막 검증일: 29일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105078
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PLASMATHERM / UNAXIS
VERSALOCK 700
카테고리
PECVD
마지막 검증일: 29일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105078
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 모델 설명
미제공문서
문서 없음