설명
설명 없음환경 설정
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 모델 설명
미제공문서
문서 없음
PLASMATHERM / UNAXIS
VERSALOCK 700
검증됨
카테고리
PECVD
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105078
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PLASMATHERM / UNAXIS
VERSALOCK 700
카테고리
PECVD
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
105078
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Process: RIE nitride and oxide. LoadLock: holds 2 cassettes and has a transfer chamber between the 2 process chambers Materials Exposure: Gas and Silicon wafers. Cortex Computer upgrade and software Dual chamber etcher. Has the vortex computer upgrade. System currently installed in Fab and running. 3 Edwards iQDP80 pumps and 2 Neslab chillers.OEM 모델 설명
미제공문서
문서 없음