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PLASMATHERM LAPECVD
    설명
    설명 없음
    환경 설정
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEM 모델 설명
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    문서

    문서 없음

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    검증됨

    카테고리
    PECVD

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    62674


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    빈티지: 2009조건: 중고
    마지막 검증일60일 이상 전

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    검증됨
    카테고리
    PECVD
    마지막 검증일: 60일 이상 전
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/03565e4565c04ae3bc771bfc463d71ea_499b92a1f4794b9295d6f0d0ad0e7a801201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/b7eae78bf9c7426187975267f4c7688b_91d0dd3b47b1450ab04b57daaafc81d31201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/404626f9c5e345e6b21e4eea73fe728e_8e67d42f4dc04b6e9c67dc9a2a4f84481201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/7f541f28bad841c49eda37d1fcf34eb7_b405d58decde4e5aa78145daee99f2151201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/c768eefbace94ec5bb80a8cba8082065_b7ed8ec56c2041ea839d952c42907e721201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/3f7e2507ca4b4e7cb678fd76fd0b861b_fec7e08042914eebb43a4e76bae403321201a_mw.jpeg
    listing-photo-2a657aebb51d4a2fbc55246822d5bb3e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1904/2a657aebb51d4a2fbc55246822d5bb3e/7bdd771c403b4126af67297130dd4c31_0dcd9729c8a74ceb83063769afabeecd1201a_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    62674


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Plasma Enhanced Chemical Vapor Deposition System -PM3 Voltage:208 VOLTS Frequency:50/60 HERTZ Phase:3 Current:63 AMPS Dimensions: Standard Overall: 83 x 46 x 89 IN - 1500 LBS
    OEM 모델 설명
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    문서

    문서 없음

    유사 등재물
    모두 보기
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD빈티지: 2009조건: 중고마지막 검증일:60일 이상 전
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD빈티지: 2006조건: 중고마지막 검증일:8일 전