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설명
설명 없음환경 설정
4 chamber PECVDOEM 모델 설명
VERSALINE PECVD systems can deposit many different high-quality films, ensuring you get maximum, reliable high productivity at a low total cost of ownership. Process Silane-based films (a-Si, SiO2, SiNx, SiON, SiC, SiOF, a-SiC) TEOS films Stress control High and low deposition rates Tunable refractive index문서
문서 없음
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
110100
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PLASMATHERM
VERSALINE PECVD
카테고리
PECVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
110100
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
4 chamber PECVDOEM 모델 설명
VERSALINE PECVD systems can deposit many different high-quality films, ensuring you get maximum, reliable high productivity at a low total cost of ownership. Process Silane-based films (a-Si, SiO2, SiNx, SiON, SiC, SiOF, a-SiC) TEOS films Stress control High and low deposition rates Tunable refractive index문서
문서 없음