설명
Inert Gas Oven환경 설정
환경 설정 없음OEM 모델 설명
Ultratech Stepper Inc. has launched the Model 1500MVS, the latest addition to its well-established Model 1500 Lithography Series. The Model 1500MVS incorporates Ultratech’s machine vision system (MVS), which provides enhanced alignment flexibility that is not achievable using traditional alignment methods. As a pattern recognition alignment system, the MVS eliminates the need for larger scribe lines between dies to accommodate dedicated alignment targets, resulting in an increase in the number of net die-per-wafer. According to Ultratech, the Model 1500’s MVS capability enables it to recognize targets produced for any other lithography tool, thereby eliminating the need for dedicated targets and facilitating the implementation of mix-and-match strategies.문서
문서 없음
VEECO / ULTRATECH
1500 MVS
검증됨
카테고리
Photolithography
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
44643
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / ULTRATECH
1500 MVS
검증됨
카테고리
Photolithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
44643
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Inert Gas Oven환경 설정
환경 설정 없음OEM 모델 설명
Ultratech Stepper Inc. has launched the Model 1500MVS, the latest addition to its well-established Model 1500 Lithography Series. The Model 1500MVS incorporates Ultratech’s machine vision system (MVS), which provides enhanced alignment flexibility that is not achievable using traditional alignment methods. As a pattern recognition alignment system, the MVS eliminates the need for larger scribe lines between dies to accommodate dedicated alignment targets, resulting in an increase in the number of net die-per-wafer. According to Ultratech, the Model 1500’s MVS capability enables it to recognize targets produced for any other lithography tool, thereby eliminating the need for dedicated targets and facilitating the implementation of mix-and-match strategies.문서
문서 없음