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환경 설정 없음OEM 모델 설명
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.문서
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VEECO / ULTRATECH
SATURN SPECTRUM 300
검증됨
카테고리
Photolithography
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50448
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
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VEECO / ULTRATECH
SATURN SPECTRUM 300
검증됨
카테고리
Photolithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
50448
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.문서
문서 없음