설명
Missing parts: RF generator, controller, power rack, control circuit board, internal liner환경 설정
Process Chamber: Enabler Turbo Pump: Shimadzu TMP-3403LMC WFIB: 300mm Enabler WHIB eFIB: 300mm Enabler eFIB Independent Gas Injection: Selectable between 2 gases for each stepOEM 모델 설명
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.문서
문서 없음
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
검증됨
카테고리
Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
87569
웨이퍼 사이즈:
12"/300mm
빈티지:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
카테고리
Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
87569
웨이퍼 사이즈:
12"/300mm
빈티지:
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Missing parts: RF generator, controller, power rack, control circuit board, internal liner환경 설정
Process Chamber: Enabler Turbo Pump: Shimadzu TMP-3403LMC WFIB: 300mm Enabler WHIB eFIB: 300mm Enabler eFIB Independent Gas Injection: Selectable between 2 gases for each stepOEM 모델 설명
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.문서
문서 없음