설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.문서
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APPLIED MATERIALS (AMAT)
CENTURA IPS
검증됨
카테고리
Plasma Etch
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
63390
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
검증됨
카테고리
Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
63390
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.문서
문서 없음