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APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER
    설명
    설명 없음
    환경 설정
    Turbo pump: Alcatel ATH 1600M Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Biasa: Daihen RMN-50N1 (p/n : 0190-15322) Source:60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: ENI B-5002 (p/n : 0190-15320) 60 HHz: AE Ovation 2760 (p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: p/n : 0010-24353
    OEM 모델 설명
    Well-established in logic, memory, and foundry fabs worldwide, eMAX provides this extensive installed base with extendibility of a proven chamber.For next generation applications, optional hardware refinements (dual-zone gas feed, multiple RF frequencies, and enhanced pumping capability) produce higher etch rates, improved uniformity, and tighter profile control while eliminating wafer-edge effects. To balance selectivity versus etch capability, especially for high aspect ratio etch, eMAX operates in a low pressure/high gas flow regime complemented by process chemistries specifically tailored to optimize resist and baselayer selectivities.Rapid wafer handling, high etch rates, and four-chamber capabilities translate into high productivity. Effective polymer deposition management through temperature controls and plasma confinement facilitates extended production runs. Longer mean time between cleans (>150 RF hours), high system throughput, 90%+ up time, and low consumables costs combine to create a production-proven, reliable, cost-effective etch system.
    문서

    문서 없음

    APPLIED MATERIALS (AMAT)

    EMAX CT+ CHAMBER

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    검증됨

    카테고리

    Plasma Etch
    마지막 검증일: 60일 이상 전
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    28756


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2007

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER
    APPLIED MATERIALS (AMAT)EMAX CT+ CHAMBERPlasma Etch
    빈티지: 2007조건: 중고
    마지막 검증일60일 이상 전

    APPLIED MATERIALS (AMAT)

    EMAX CT+ CHAMBER

    verified-listing-icon

    검증됨

    카테고리

    Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-9630df81754b492691e35aaf407d171d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1182/9630df81754b492691e35aaf407d171d/2f6421f936194e5a810b378289fd31cd_631be687c59b4f92a9dc282b485eb96845005c_f.jpeg
    listing-photo-9630df81754b492691e35aaf407d171d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1182/9630df81754b492691e35aaf407d171d/c0d92aea5d0744a99b8bfc6beeab8eec_a5a715a5e274462b89b194af8126acac_f.jpeg
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    listing-photo-9630df81754b492691e35aaf407d171d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1182/9630df81754b492691e35aaf407d171d/4441106540d04cdc8a44eca2f24487ee_7f1e3705004149f89a0f52b078ac17bc1201a_f.jpeg
    listing-photo-9630df81754b492691e35aaf407d171d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1182/9630df81754b492691e35aaf407d171d/5b9ad8ea697b479bb10687bfe39095c3_3d062f8b789f47c5818b121ef327359945005c_f.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    28756


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2007


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Turbo pump: Alcatel ATH 1600M Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Biasa: Daihen RMN-50N1 (p/n : 0190-15322) Source:60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: ENI B-5002 (p/n : 0190-15320) 60 HHz: AE Ovation 2760 (p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: p/n : 0010-24353
    OEM 모델 설명
    Well-established in logic, memory, and foundry fabs worldwide, eMAX provides this extensive installed base with extendibility of a proven chamber.For next generation applications, optional hardware refinements (dual-zone gas feed, multiple RF frequencies, and enhanced pumping capability) produce higher etch rates, improved uniformity, and tighter profile control while eliminating wafer-edge effects. To balance selectivity versus etch capability, especially for high aspect ratio etch, eMAX operates in a low pressure/high gas flow regime complemented by process chemistries specifically tailored to optimize resist and baselayer selectivities.Rapid wafer handling, high etch rates, and four-chamber capabilities translate into high productivity. Effective polymer deposition management through temperature controls and plasma confinement facilitates extended production runs. Longer mean time between cleans (>150 RF hours), high system throughput, 90%+ up time, and low consumables costs combine to create a production-proven, reliable, cost-effective etch system.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER
    APPLIED MATERIALS (AMAT)
    EMAX CT+ CHAMBER
    Plasma Etch빈티지: 2007조건: 중고마지막 검증일: 60일 이상 전
    APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER
    APPLIED MATERIALS (AMAT)
    EMAX CT+ CHAMBER
    Plasma Etch빈티지: 2003조건: 중고마지막 검증일: 60일 이상 전
    APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER
    APPLIED MATERIALS (AMAT)
    EMAX CT+ CHAMBER
    Plasma Etch빈티지: 2007조건: 중고마지막 검증일: 60일 이상 전