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LAM RESEARCH CORPORATION AUTOETCH 590
    설명
    Dielectric Etch
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.
    문서

    문서 없음

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    verified-listing-icon

    검증됨

    카테고리
    Plasma Etch

    마지막 검증일: 9일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    100622


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음

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    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
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    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Plasma Etch
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    verified-listing-icon
    검증됨
    카테고리
    Plasma Etch
    마지막 검증일: 9일 전
    listing-photo-297a4e475d7b4f42a940dc03108a9d8c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    100622


    웨이퍼 사이즈:

    6"/150mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Dielectric Etch
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Plasma Etch빈티지: 0조건: 중고마지막 검증일: 60일 이상 전
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Plasma Etch빈티지: 0조건: 중고마지막 검증일: 9일 전
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Plasma Etch빈티지: 0조건: 중고마지막 검증일: 60일 이상 전