설명
Aja International Phase II J Computer Control; Model: ATC 1800-V Sputter System; Year: 2013. (2) Adixen's Vacuum Pumps. (2) Pfeiffer Vacuum Pumps환경 설정
환경 설정 없음OEM 모델 설명
AJA INTERNATIONAL, INC’s ATC 1800 is a versatile PVD coating tool that can be built in a variety of configurations to satisfy most requirements. It is part of the ATC Flagship Series Sputtering Systems and is built around AJA’s unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis thin film deposition. The ATC 1800 can be built in a variety of configurations to satisfy most requirements. For example, it can be fitted with (5) 2" magnetrons with in-situ tilt. These versatile sputtering systems can also be fitted with other deposition sources (e-beam evaporation, thermal evaporation and PLD), ion sources, facing target sputtering sources (FTS), contact masking systems, metal-sealed tops, bake jackets, glove boxes, cassettes, auto-loading and analytical tools (RHEED, XPS, Auger, RGA, Ellipsometers and MOS).문서
문서 없음
카테고리
PVD / Sputtering
마지막 검증일: 12일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
139321
웨이퍼 사이즈:
알 수 없음
빈티지:
2013
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC 1800-V
카테고리
PVD / Sputtering
마지막 검증일: 12일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
139321
웨이퍼 사이즈:
알 수 없음
빈티지:
2013
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Aja International Phase II J Computer Control; Model: ATC 1800-V Sputter System; Year: 2013. (2) Adixen's Vacuum Pumps. (2) Pfeiffer Vacuum Pumps환경 설정
환경 설정 없음OEM 모델 설명
AJA INTERNATIONAL, INC’s ATC 1800 is a versatile PVD coating tool that can be built in a variety of configurations to satisfy most requirements. It is part of the ATC Flagship Series Sputtering Systems and is built around AJA’s unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis thin film deposition. The ATC 1800 can be built in a variety of configurations to satisfy most requirements. For example, it can be fitted with (5) 2" magnetrons with in-situ tilt. These versatile sputtering systems can also be fitted with other deposition sources (e-beam evaporation, thermal evaporation and PLD), ion sources, facing target sputtering sources (FTS), contact masking systems, metal-sealed tops, bake jackets, glove boxes, cassettes, auto-loading and analytical tools (RHEED, XPS, Auger, RGA, Ellipsometers and MOS).문서
문서 없음