설명
Mostly used for NPI products환경 설정
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 모델 설명
미제공문서
문서 없음
카테고리
PVD / Sputtering
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
143004
웨이퍼 사이즈:
알 수 없음
빈티지:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC-ORION 8
카테고리
PVD / Sputtering
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
143004
웨이퍼 사이즈:
알 수 없음
빈티지:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Mostly used for NPI products환경 설정
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 모델 설명
미제공문서
문서 없음