설명
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN환경 설정
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 모델 설명
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.문서
문서 없음
카테고리
PVD / Sputtering
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
136521
웨이퍼 사이즈:
12"/300mm
빈티지:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
ENDURA II
카테고리
PVD / Sputtering
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
136521
웨이퍼 사이즈:
12"/300mm
빈티지:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN환경 설정
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 모델 설명
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.문서
문서 없음