설명
1. COMPLETE OEM SYSTEM: LEYBOLD 2. Leybold Sputtering chamber: Approximately 24” in diameter. 3. Leybold RF-Etching, RF Sputtering. 4. Leybold Matching network. 5. Leybold RF-biassystem. 6. Leybold Turbo pump model TMP450, Leybold controller Model NT450 7. Leybold Control Rack: 18Kva, 35A. 7-1 Leybold Thermovac TM 220S2 Leybold Penningvac vacuum system. 7-2 Leybold Model ME03 0-10V 2 ea. Leybold Model ATP 01 Digital Displays and Auto Switches. 8. Total (4 per side) Up/Down Control Arrows Display Screen Keypads: LEYBOLD A 550 VZK, From the Manufacturer: Characteristics - High sputtering rates - Low substrate temperature during sputtering - Excellent layer thickness uniformity resulting from variable cathode to substrate spacing and symmetrical arrangement of the sputtering chamber High throughput - Processes: RF-etching, RF-sputtering, RF-bias-sputtering – Sputtering chamber is easily accessible - Microprocessor controlled - Turbo pumped System Design The 590-mm diameter vacuum chamber incorporates: - Turbo pumped - Baffles for pre-sputtering and sputter-etching, - The water-cooled substrate carrier, The substrate mounting plate In addition, A550 VZK includes RF power supplies (IS 7.5 for sputtering, and TIS 1.2 for sputter-etching and bias sputtering), automatically adapted impedance matching networks, and an equipment rack holding the central controller. System design and Operation The relatively low chamber volume allows extremely short pump down times. The separation between substrates and target is optimized for the attainment of stable, homogeneous, film distributions. Finally, a Generously configured shutter prevents cross-contamination of cathode and substrates. Operation and Cleaning The system offers a high degree of accessibility for manual loading and unloading. This high degree of accessibility also simplifies routine cleaning of the coating chamber. Careful cleaning of the coating chamber is essential for maintenance of the highest coating quality standards. In designing the A550 VZK, close attention was paid to providing the user with the opportunity for simplified and thorough maintenance: - easily removable baffles that prevent sputtering deposits on chamber walls; A significant plus of all of LEYBOLDS systems are their expertly engineered compliments of vacuum equipment, the quality and dependability of your final products and your processing are closely reliant upon the maintenance of prescribed vacuum conditions. The A 550 VZK is supplied equipped with a turbomolecular pump and a two-stage rotary vane pump. A final vacuum of 5 x 10-7mbar can be reached using a chamber wall. Vacuum systems from LEYBOLD are reliable in operation and are integrated into the overall control system, and thus able to perform their duties fully automatically.환경 설정
환경 설정 없음OEM 모델 설명
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LEYBOLD HERAEUS
A550 VZK
검증됨
카테고리
PVD / Sputtering
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
43214
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LEYBOLD HERAEUS
A550 VZK
카테고리
PVD / Sputtering
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
43214
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
1. COMPLETE OEM SYSTEM: LEYBOLD 2. Leybold Sputtering chamber: Approximately 24” in diameter. 3. Leybold RF-Etching, RF Sputtering. 4. Leybold Matching network. 5. Leybold RF-biassystem. 6. Leybold Turbo pump model TMP450, Leybold controller Model NT450 7. Leybold Control Rack: 18Kva, 35A. 7-1 Leybold Thermovac TM 220S2 Leybold Penningvac vacuum system. 7-2 Leybold Model ME03 0-10V 2 ea. Leybold Model ATP 01 Digital Displays and Auto Switches. 8. Total (4 per side) Up/Down Control Arrows Display Screen Keypads: LEYBOLD A 550 VZK, From the Manufacturer: Characteristics - High sputtering rates - Low substrate temperature during sputtering - Excellent layer thickness uniformity resulting from variable cathode to substrate spacing and symmetrical arrangement of the sputtering chamber High throughput - Processes: RF-etching, RF-sputtering, RF-bias-sputtering – Sputtering chamber is easily accessible - Microprocessor controlled - Turbo pumped System Design The 590-mm diameter vacuum chamber incorporates: - Turbo pumped - Baffles for pre-sputtering and sputter-etching, - The water-cooled substrate carrier, The substrate mounting plate In addition, A550 VZK includes RF power supplies (IS 7.5 for sputtering, and TIS 1.2 for sputter-etching and bias sputtering), automatically adapted impedance matching networks, and an equipment rack holding the central controller. System design and Operation The relatively low chamber volume allows extremely short pump down times. The separation between substrates and target is optimized for the attainment of stable, homogeneous, film distributions. Finally, a Generously configured shutter prevents cross-contamination of cathode and substrates. Operation and Cleaning The system offers a high degree of accessibility for manual loading and unloading. This high degree of accessibility also simplifies routine cleaning of the coating chamber. Careful cleaning of the coating chamber is essential for maintenance of the highest coating quality standards. In designing the A550 VZK, close attention was paid to providing the user with the opportunity for simplified and thorough maintenance: - easily removable baffles that prevent sputtering deposits on chamber walls; A significant plus of all of LEYBOLDS systems are their expertly engineered compliments of vacuum equipment, the quality and dependability of your final products and your processing are closely reliant upon the maintenance of prescribed vacuum conditions. The A 550 VZK is supplied equipped with a turbomolecular pump and a two-stage rotary vane pump. A final vacuum of 5 x 10-7mbar can be reached using a chamber wall. Vacuum systems from LEYBOLD are reliable in operation and are integrated into the overall control system, and thus able to perform their duties fully automatically.환경 설정
환경 설정 없음OEM 모델 설명
미제공문서
문서 없음