603
카테고리
PVD / Sputtering개요
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti
활성 등재물
2
서비스
검사, 보험, 감정, 물류
