설명
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function환경 설정
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEM 모델 설명
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.문서
문서 없음
카테고리
PVD / Sputtering
마지막 검증일: 21일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138432
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PERKIN ELMER
4450
카테고리
PVD / Sputtering
마지막 검증일: 21일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138432
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function환경 설정
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEM 모델 설명
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.문서
문서 없음