설명
Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station환경 설정
환경 설정 없음OEM 모델 설명
ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.문서
문서 없음
카테고리
Reticle / Mask Inspection
마지막 검증일: 16일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140567
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
ARIS-i
카테고리
Reticle / Mask Inspection
마지막 검증일: 16일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140567
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station환경 설정
환경 설정 없음OEM 모델 설명
ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.문서
문서 없음