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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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KLA / THERMA-WAVE TP-420
    설명
    lon concentration No missing parts Current Wafer size : 8
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.
    문서

    문서 없음

    KLA / THERMA-WAVE

    TP-420

    verified-listing-icon

    검증됨

    카테고리
    Reticle / Mask Inspection

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Deinstalled


    제품 ID:

    107110


    웨이퍼 사이즈:

    6"/150mm, 8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    KLA / THERMA-WAVE TP-420

    KLA / THERMA-WAVE

    TP-420

    Reticle / Mask Inspection
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    KLA / THERMA-WAVE

    TP-420

    verified-listing-icon
    검증됨
    카테고리
    Reticle / Mask Inspection
    마지막 검증일: 60일 이상 전
    listing-photo-53079cec53404f01a086bf6c63466e94-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    Deinstalled


    제품 ID:

    107110


    웨이퍼 사이즈:

    6"/150mm, 8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    lon concentration No missing parts Current Wafer size : 8
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA / THERMA-WAVE TP-420

    KLA / THERMA-WAVE

    TP-420

    Reticle / Mask Inspection빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    KLA / THERMA-WAVE TP-420

    KLA / THERMA-WAVE

    TP-420

    Reticle / Mask Inspection빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    KLA / THERMA-WAVE TP-420

    KLA / THERMA-WAVE

    TP-420

    Reticle / Mask Inspection빈티지: 0조건: 중고마지막 검증일:60일 이상 전