설명
lon concentration No missing parts Current Wafer size : 8환경 설정
환경 설정 없음OEM 모델 설명
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.문서
문서 없음
KLA / THERMA-WAVE
TP-420
검증됨
카테고리
Reticle / Mask Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
107110
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
KLA / THERMA-WAVE
TP-420
카테고리
Reticle / Mask Inspection
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
107110
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
lon concentration No missing parts Current Wafer size : 8환경 설정
환경 설정 없음OEM 모델 설명
The Therma-Probe model TP420 is a high stability automated ion implant process control system that uses a laser-based, noncontact, nondestructive measurement technique for monitoring ion implantation and other processes. It can measure implants with doses from 1x10E11 to 1x10E15 ions/cm2 and energies from 5 keV to 3 MeV. The system is capable of handling SEMI standard 100 to 200 mm wafers.문서
문서 없음