설명
Defect Detection환경 설정
Software Version: 4.2.24 Process: Reticle InspectionOEM 모델 설명
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.문서
문서 없음
KLA
SL301
카테고리
Reticle / Mask Inspection
마지막 검증일: 4일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
153866
웨이퍼 사이즈:
12"/300mm
빈티지:
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Defect Detection환경 설정
Software Version: 4.2.24 Process: Reticle InspectionOEM 모델 설명
For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.문서
문서 없음