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LAM RESEARCH CORPORATION TCP 9600
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    TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.
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    LAM RESEARCH CORPORATION

    TCP 9600

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    검증됨

    카테고리
    RIE

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    100388


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음

    Have Additional Questions?
    Logistics Support
    Available
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    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    LAM RESEARCH CORPORATION TCP 9600

    LAM RESEARCH CORPORATION

    TCP 9600

    RIE
    빈티지: 0조건: 개조됨
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    TCP 9600

    verified-listing-icon
    검증됨
    카테고리
    RIE
    마지막 검증일: 60일 이상 전
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    주요 품목 세부 정보

    조건:

    Refurbished


    작동 상태:

    알 수 없음


    제품 ID:

    100388


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION TCP 9600

    LAM RESEARCH CORPORATION

    TCP 9600

    RIE빈티지: 0조건: 개조됨마지막 검증일: 60일 이상 전
    LAM RESEARCH CORPORATION TCP 9600

    LAM RESEARCH CORPORATION

    TCP 9600

    RIE빈티지: 0조건: 개조됨마지막 검증일: 10일 전