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STS HRM
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    OEM 모델 설명
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
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    STS

    HRM

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    RIE/ICP

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보
    조건:

    Used

    작동 상태:

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    제품 ID:

    84050

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    STS HRM

    STS

    HRM

    RIE/ICP
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    STS

    HRM

    verified-listing-icon
    검증됨
    카테고리
    RIE/ICP
    마지막 검증일: 60일 이상 전
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    주요 품목 세부 정보
    조건:

    Used

    작동 상태:

    알 수 없음

    제품 ID:

    84050

    웨이퍼 사이즈:

    알 수 없음

    빈티지:

    알 수 없음

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.
    문서

    문서 없음

    유사 등재물
    모두 보기
    STS HRM

    STS

    HRM

    RIE/ICP빈티지: 0조건: 중고마지막 검증일: 60일 이상 전