설명
설명 없음환경 설정
Centura RTP XE+ ReactorsOEM 모델 설명
The Centura RTP XE is a market-leading thermal processing tool that has recently been enhanced to create the new RTP XEplus Centura. This new version offers increased throughput and new application capabilities, including the ability to perform ultra-shallow junction formation using the Implant xR LEAP™ and RTP XEplus Centura. In addition to the RTP XEplus Centura, there are several other LPCVD product offerings available, including the Poly Centura, DCS xZ™ tungsten silicide chamber, and the Polycide xZ Centura for cost-effective integrated tungsten silicide and poly processing. For capacitor solutions, the recently-introduced Tanox xZ Centura offers high-productivity tantalum oxide deposition. These tools provide a range of options for thermal processing and other applications in semiconductor manufacturing.문서
문서 없음
카테고리
RTP/RTA
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
133389
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA RTP XE Plus
카테고리
RTP/RTA
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
133389
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Centura RTP XE+ ReactorsOEM 모델 설명
The Centura RTP XE is a market-leading thermal processing tool that has recently been enhanced to create the new RTP XEplus Centura. This new version offers increased throughput and new application capabilities, including the ability to perform ultra-shallow junction formation using the Implant xR LEAP™ and RTP XEplus Centura. In addition to the RTP XEplus Centura, there are several other LPCVD product offerings available, including the Poly Centura, DCS xZ™ tungsten silicide chamber, and the Polycide xZ Centura for cost-effective integrated tungsten silicide and poly processing. For capacitor solutions, the recently-introduced Tanox xZ Centura offers high-productivity tantalum oxide deposition. These tools provide a range of options for thermal processing and other applications in semiconductor manufacturing.문서
문서 없음