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APPLIED MATERIALS (AMAT) CENTURA RADIANCE
    설명
    1MF+3ch
    환경 설정
    RTP*3
    OEM 모델 설명
    Radiance Centura has been ergonomically designed. Each chamber has its own gas panel and the gas panel has been relocated to its current position below the chamber to make it more accessible. Radiance Centura 300mm chamber is available for atmospheric pressure and reduced pressure processing. Rurming the Radiance chamber at reduced pressure is usefiil for systems that have a LPCVD and RTP chamber on the same mainframe because it saves the total production time by reducing the time spent pumping up and down the transfer chamber between wafers. Centura Radiance™ is a production proven process tool of record for the 0.13µm node in various wafer fabrication facilities across the world. Typical temperature – time performance in the Centura Radiance™ chamber.
    문서

    문서 없음

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    검증됨

    카테고리
    RTP/RTA

    마지막 검증일: 9일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    150696


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA RADIANCE

    APPLIED MATERIALS (AMAT)

    CENTURA RADIANCE

    RTP/RTA
    빈티지: 2007조건: 중고
    마지막 검증일9일 전

    APPLIED MATERIALS (AMAT)

    CENTURA RADIANCE

    verified-listing-icon
    검증됨
    카테고리
    RTP/RTA
    마지막 검증일: 9일 전
    listing-photo-fb89404b57764c9f9df6da1b84f85690-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    150696


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    1MF+3ch
    환경 설정
    RTP*3
    OEM 모델 설명
    Radiance Centura has been ergonomically designed. Each chamber has its own gas panel and the gas panel has been relocated to its current position below the chamber to make it more accessible. Radiance Centura 300mm chamber is available for atmospheric pressure and reduced pressure processing. Rurming the Radiance chamber at reduced pressure is usefiil for systems that have a LPCVD and RTP chamber on the same mainframe because it saves the total production time by reducing the time spent pumping up and down the transfer chamber between wafers. Centura Radiance™ is a production proven process tool of record for the 0.13µm node in various wafer fabrication facilities across the world. Typical temperature – time performance in the Centura Radiance™ chamber.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) CENTURA RADIANCE

    APPLIED MATERIALS (AMAT)

    CENTURA RADIANCE

    RTP/RTA빈티지: 2007조건: 중고마지막 검증일:9일 전
    APPLIED MATERIALS (AMAT) CENTURA RADIANCE

    APPLIED MATERIALS (AMAT)

    CENTURA RADIANCE

    RTP/RTA빈티지: 2006조건: 중고마지막 검증일:9일 전