설명
The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.환경 설정
환경 설정 없음OEM 모델 설명
The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).문서
문서 없음
ANNEALSYS
AS-One
카테고리
RTP/RTA
마지막 검증일: 19일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138663
웨이퍼 사이즈:
2"/50mm, 3"/75mm, 4"/100mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.환경 설정
환경 설정 없음OEM 모델 설명
The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).문서
문서 없음