설명
설명 없음환경 설정
-Computer Advantech Pentium 4 3.0GHz CPU with 1GB of RAM OS: MS Windows xP Ver. 2002 SP2 Software: FEI UI1280 xP ver 3.8 451 -SEM SFEG2 Electron column Hexalens Operating voltage: 200V to 30KV Operating mode: 1) Low resolution Search Mode (SHR) 2) Ultra High Resolution Mode (UHR) Resolution < 3nm@30kV, 7mm WD -Ion Beam (FIB) Liquid Metal Ion Source (gallium) Operating voltage: 30KV Available beam sizes: 1pA, 10pA, 50pA, 100pA, 300pA, 500pA, 1nA, 3nA, 5nA, 7nA, 20nA Resolution < 7nm @ 30kV, 1pA, 16.5mm WD -Stage Fully Automatic Loadlock loading system 200mm full travel; X, Y, Z, R and Tilt Tilt -6º to 52º Sample size: 8” (200mm) wafer; 4” (100mm)wafer; chips Accuracy over Full Stroke < 1.5um -Gas Injection System Gas injectors avaialbe: 4* 1) Platinum (PT) gas injector a) Deposition of metal on select area 2) Reveal Delination Etch a) FEI proprietory etchant gas 3) XeF₂ (Insulator Enhanced Etch) a) Flourine based etchant b) Enhanced rapid etch of SiO₂ materials 4) Insulator Deposition** a) Deposit insulator (SiO₂) on select area ** Option not yet availableOEM 모델 설명
미제공문서
문서 없음
카테고리
SEM / FIB
마지막 검증일: 23일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
142931
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
ALTURA 835
카테고리
SEM / FIB
마지막 검증일: 23일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
142931
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
-Computer Advantech Pentium 4 3.0GHz CPU with 1GB of RAM OS: MS Windows xP Ver. 2002 SP2 Software: FEI UI1280 xP ver 3.8 451 -SEM SFEG2 Electron column Hexalens Operating voltage: 200V to 30KV Operating mode: 1) Low resolution Search Mode (SHR) 2) Ultra High Resolution Mode (UHR) Resolution < 3nm@30kV, 7mm WD -Ion Beam (FIB) Liquid Metal Ion Source (gallium) Operating voltage: 30KV Available beam sizes: 1pA, 10pA, 50pA, 100pA, 300pA, 500pA, 1nA, 3nA, 5nA, 7nA, 20nA Resolution < 7nm @ 30kV, 1pA, 16.5mm WD -Stage Fully Automatic Loadlock loading system 200mm full travel; X, Y, Z, R and Tilt Tilt -6º to 52º Sample size: 8” (200mm) wafer; 4” (100mm)wafer; chips Accuracy over Full Stroke < 1.5um -Gas Injection System Gas injectors avaialbe: 4* 1) Platinum (PT) gas injector a) Deposition of metal on select area 2) Reveal Delination Etch a) FEI proprietory etchant gas 3) XeF₂ (Insulator Enhanced Etch) a) Flourine based etchant b) Enhanced rapid etch of SiO₂ materials 4) Insulator Deposition** a) Deposit insulator (SiO₂) on select area ** Option not yet availableOEM 모델 설명
미제공문서
문서 없음