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설명
BIO-RAD QS-1200 FT-IR BIO-RAD FT-IR QS-300 Spectrometer .FTS-175 Spectrometer - He-Ne Laser - IR Source - DTGS Detector - KBr Beam Splitter .Wafer Tray/Nose Cone .FTS Power Supply .EPI / BPSG Application환경 설정
Working S/W Version : QS1200 Ver 3.0 .Windows XP PC & LCD MonitorOEM 모델 설명
The QS1200 is a desktop FTIR metrology tool designed for advanced semiconductor fabs. It is used for dopant monitoring, epi thickness measurement, and other applications. The tool can accommodate SEMI standard wafers of 100, 125, 150, 200, and 300mm diameter, as well as odd shaped wafer pieces and 2mm thick silicon slices. An optional single wafer mapping stage is available for all wafer sizes. The QS1200 also features unique algorithms for instant qualification of SOI, SiC, and other epitaxial films. Its built-in intelligence extends its applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify the thickness of recycled test wafers for rapid payback. This tool provides a new level of integration of the FTIR technique utilizing proven optical technology.문서
문서 없음
카테고리
Spectrometer / SIMS
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
65974
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
QS1200
카테고리
Spectrometer / SIMS
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
65974
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
BIO-RAD QS-1200 FT-IR BIO-RAD FT-IR QS-300 Spectrometer .FTS-175 Spectrometer - He-Ne Laser - IR Source - DTGS Detector - KBr Beam Splitter .Wafer Tray/Nose Cone .FTS Power Supply .EPI / BPSG Application환경 설정
Working S/W Version : QS1200 Ver 3.0 .Windows XP PC & LCD MonitorOEM 모델 설명
The QS1200 is a desktop FTIR metrology tool designed for advanced semiconductor fabs. It is used for dopant monitoring, epi thickness measurement, and other applications. The tool can accommodate SEMI standard wafers of 100, 125, 150, 200, and 300mm diameter, as well as odd shaped wafer pieces and 2mm thick silicon slices. An optional single wafer mapping stage is available for all wafer sizes. The QS1200 also features unique algorithms for instant qualification of SOI, SiC, and other epitaxial films. Its built-in intelligence extends its applicability to almost every film material imaginable. Additionally, it is versatile enough to qualify the thickness of recycled test wafers for rapid payback. This tool provides a new level of integration of the FTIR technique utilizing proven optical technology.문서
문서 없음