설명
Complete system, no missing parts환경 설정
환경 설정 없음OEM 모델 설명
The CAMECA IMS-6f is an ultra-high vacuum (UHV) system designed for secondary ion mass spectrometry (SIMS) analysis. Equipped with a magnetic sector analyzer, it offers exceptional mass resolving power, with a minimum m/Dm of 25000 (10% definition). The system features a duoplasmatron source that can produce O2+ or O- ions, and a microbeam source for Cs+ ions, providing premium beam stability and ultra-fine minimum beam size (300nm for O2+ and 200nm for Cs+). Key capabilities of the IMS-6f include low detection limits and high resolving power in depth profiling, ultra-shallow depth profiling, 3D ion imaging, and excellent charge neutralization, making it an advanced tool for studying material surfaces and interfaces at the nanoscale.문서
문서 없음
CAMECA
IMS-6f
검증됨
카테고리
Spectrometer / SIMS
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
100384
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CAMECA
IMS-6f
카테고리
Spectrometer / SIMS
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
100384
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Complete system, no missing parts환경 설정
환경 설정 없음OEM 모델 설명
The CAMECA IMS-6f is an ultra-high vacuum (UHV) system designed for secondary ion mass spectrometry (SIMS) analysis. Equipped with a magnetic sector analyzer, it offers exceptional mass resolving power, with a minimum m/Dm of 25000 (10% definition). The system features a duoplasmatron source that can produce O2+ or O- ions, and a microbeam source for Cs+ ions, providing premium beam stability and ultra-fine minimum beam size (300nm for O2+ and 200nm for Cs+). Key capabilities of the IMS-6f include low detection limits and high resolving power in depth profiling, ultra-shallow depth profiling, 3D ion imaging, and excellent charge neutralization, making it an advanced tool for studying material surfaces and interfaces at the nanoscale.문서
문서 없음