설명
설명 없음환경 설정
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEM 모델 설명
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.문서
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ASML
PAS 5000/55
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
112208
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5000/55
카테고리
Steppers & Scanners
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
112208
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEM 모델 설명
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.문서
문서 없음