설명
설명 없음환경 설정
SW_RELEASE 080806 MAGIC_STRING tkwMWFU0{UN WAFER_STEPPER OPTIONS SECS KEY g|VcVAw4iVk REFL_IMAGE_SENSOR KEY g|VcVAw0yVk PEP_1_PRODUCTIVITY_UPGRADE KEY C2hq5DExVjP PEP_2_PRODUCTIVITY_UPGRADE KEY E6ZxUltzzgj RETICLE_ERROR_COMPENSATION KEY ezPvMVMFY8K FLATNESS_MODEL KEY wRRhwXm4D8R LSQ_DISTO_MODEL KEY oxPhQhQj60R MARK_SENSOR KEY ElVc1Qr|e4h BATCH_STREAMING KEY xK4jj9z78Ul INTENSITY_2 KEY L{{4XJJOUks FOCUS_MONITORING KEY Vk80bFKFgFv FOCAL_ADJUSTMENT KEY xK49L3zFwUl EXTENDED_EXPOSURE KEY x05F|7w29Vl FAST_TTL_ALIGNMENT KEY s5kl|kb8cIv PEP_LEVEL_ALIGNMENT_1 KEY 6lKCIhPxpyB PEP_WAFER_SWAP_4 KEY tHxoZuAW3VXOEM 모델 설명
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60문서
문서 없음
ASML
PAS 5500/100D
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111837
웨이퍼 사이즈:
6"/150mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ASML
PAS 5500/100D
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111837
웨이퍼 사이즈:
6"/150mm
빈티지:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
SW_RELEASE 080806 MAGIC_STRING tkwMWFU0{UN WAFER_STEPPER OPTIONS SECS KEY g|VcVAw4iVk REFL_IMAGE_SENSOR KEY g|VcVAw0yVk PEP_1_PRODUCTIVITY_UPGRADE KEY C2hq5DExVjP PEP_2_PRODUCTIVITY_UPGRADE KEY E6ZxUltzzgj RETICLE_ERROR_COMPENSATION KEY ezPvMVMFY8K FLATNESS_MODEL KEY wRRhwXm4D8R LSQ_DISTO_MODEL KEY oxPhQhQj60R MARK_SENSOR KEY ElVc1Qr|e4h BATCH_STREAMING KEY xK4jj9z78Ul INTENSITY_2 KEY L{{4XJJOUks FOCUS_MONITORING KEY Vk80bFKFgFv FOCAL_ADJUSTMENT KEY xK49L3zFwUl EXTENDED_EXPOSURE KEY x05F|7w29Vl FAST_TTL_ALIGNMENT KEY s5kl|kb8cIv PEP_LEVEL_ALIGNMENT_1 KEY 6lKCIhPxpyB PEP_WAFER_SWAP_4 KEY tHxoZuAW3VXOEM 모델 설명
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60문서
문서 없음