메인 콘텐츠로 건너뛰기
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기

Moov logo

Moov Icon
ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
설명
(1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
환경 설정
The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
OEM 모델 설명
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
문서
카테고리
Steppers & Scanners

마지막 검증일: 30일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

105053


웨이퍼 사이즈:

12"/300mm


빈티지:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ASML

TWINSCAN XT:1900Gi

verified-listing-icon
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 30일 이상 전
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/13ac333a987642f4a4bdd6b44b0bb473_c302b0aabbe6472a98bb87646ecc0f391201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/5fa191f9d0224d35b23636871bd01b11_cd74f47b816b43ef91be208953c707751201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/9318b64de9dd4003a5b73d45f8059a2a_8a6ef44367664167aecd28db89accd6f1201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/fae93219e83a412a988bef863f46a6ef_b5b3e2ddf3874ea5b3658d809d31e49e1201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/2e9bc82132514f44b1c9d2616be13792_44853d704610440ab58a5ec8d69fd22f1201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/80af2d6360614e7d90bb70ca216ce786_8c8e5cc6278e4ceb9328b644c96fc551_mw.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

105053


웨이퍼 사이즈:

12"/300mm


빈티지:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
(1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
환경 설정
The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
OEM 모델 설명
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
문서