설명
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.환경 설정
0.18 0.60~0.73 4:1 26*33 35OEM 모델 설명
The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.문서
문서 없음
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131688
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-5000ES3
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131688
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Canon KrF lithography machine uses a 248nm wavelength KrF excimer laser as the exposure light source. It is suitable for more sophisticated semiconductor processes and is widely used in the manufacture of high-performance semiconductor devices. It has better alignment accuracy and plays an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.환경 설정
0.18 0.60~0.73 4:1 26*33 35OEM 모델 설명
The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.문서
문서 없음