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CANON FPA 5000 IZA is a high throughput i-line stepper that delivers significant CoO advantages when exposing layers down to 350nm. This lithography system has overlay accuracy of 16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy. It delivers super productivity at 155wph (200mm wafers) or 93wph (300mm wafers) The CANON FPA 5000 IZA has a 4.5kW high-pressured mercury lamp.
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