설명
NIKON DUV STEPPER환경 설정
-Software Version: MCSV E3.42, OCSV E3.42, -CIM: SECS -Process: Lithography Exposure Step and Repeat Stepper -Main System NSR Main Body & Control Rack 1 OK -Main System Cymer Laser 1 OK -Main System Temperature Controller Rack 1 OK -Main System -Handler System Wafer Loader Type 3 1 OK -Factory Interface SMIF 2 OKOEM 모델 설명
The DUV Stepper is an all-in-one KrF system for high-volume production of advanced logic and memory ICs. It features a 0.60 NA sense for 0.25 micron resolution and can process over 85 200mm wafers per hour. The exposure area is 22mm x 22mm.문서
문서 없음
NIKON
NSR-2205EX14C
검증됨
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
103910
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
NIKON
NSR-2205EX14C
카테고리
Steppers & Scanners
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
103910
웨이퍼 사이즈:
8"/200mm
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
NIKON DUV STEPPER환경 설정
-Software Version: MCSV E3.42, OCSV E3.42, -CIM: SECS -Process: Lithography Exposure Step and Repeat Stepper -Main System NSR Main Body & Control Rack 1 OK -Main System Cymer Laser 1 OK -Main System Temperature Controller Rack 1 OK -Main System -Handler System Wafer Loader Type 3 1 OK -Factory Interface SMIF 2 OKOEM 모델 설명
The DUV Stepper is an all-in-one KrF system for high-volume production of advanced logic and memory ICs. It features a 0.60 NA sense for 0.25 micron resolution and can process over 85 200mm wafers per hour. The exposure area is 22mm x 22mm.문서
문서 없음