설명
설명 없음환경 설정
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5″ substrate table assembry is mounted within this low volume adapter. Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7″ diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.OEM 모델 설명
미제공문서
카테고리
Thermal Evaporators
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138431
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
FERROTEC / TEMESCAL
BJD 1800
카테고리
Thermal Evaporators
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138431
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available