설명
설명 없음환경 설정
Film Thickness MeasurementOEM 모델 설명
The Atlas II+ is an advanced Optical CD (OCD) Metrology System developed by Nanometrics. It is designed for high-performance process control metrology and incorporates innovations in optical components, precision wafer positioning, and new software analysis. The system is capable of measuring the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. It also provides unprecedented stability in focus performance and can measure a range of structures, including asymmetric spacers and 3-D gratings. The Atlas II+ is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with spectroscopic reflectometer (SR) and spectroscopic ellipsometer (SE) metrology modules. It also offers a doubling of wafer throughput and an order of magnitude improvement in wafer positioning precision, enabling significant increases in data volume and lowering the system’s cost of ownership. Additionally, it can be optionally equipped with NanoCD Suite for OCD and wafer stress/bow measurement capabilities.문서
문서 없음
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
98251
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS II+
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
98251
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Film Thickness MeasurementOEM 모델 설명
The Atlas II+ is an advanced Optical CD (OCD) Metrology System developed by Nanometrics. It is designed for high-performance process control metrology and incorporates innovations in optical components, precision wafer positioning, and new software analysis. The system is capable of measuring the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. It also provides unprecedented stability in focus performance and can measure a range of structures, including asymmetric spacers and 3-D gratings. The Atlas II+ is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with spectroscopic reflectometer (SR) and spectroscopic ellipsometer (SE) metrology modules. It also offers a doubling of wafer throughput and an order of magnitude improvement in wafer positioning precision, enabling significant increases in data volume and lowering the system’s cost of ownership. Additionally, it can be optionally equipped with NanoCD Suite for OCD and wafer stress/bow measurement capabilities.문서
문서 없음