설명
good working condition, can demonstrate환경 설정
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEM 모델 설명
미제공문서
문서 없음
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
검증됨
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66396
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 210
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66396
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
good working condition, can demonstrate환경 설정
- Range of Thicknesses: 100 to 500,000 angstroms - Typical Measurement Time: 2.5 seconds. - Spot Size: 50 um with 5x objective 25 um with 10x objective 6.5 um with 40x objective - Film Types Measured: Oxide on Silicon Nitride on Silicon Negative Resist on Silicon Polysilicon on Oxide Negative Resist on Oxide Nitride on Oxide Polyimide on Silicon Positive Resist on Silicon Positive Resist on Oxide - Reflectance Mode: Thick Films - Reproducibility: 5A ± 5% depending upon the film typeOEM 모델 설명
미제공문서
문서 없음