설명
Nanometrics Nanospec 4150 Film Thickness Measure환경 설정
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM 모델 설명
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.문서
문서 없음
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
검증됨
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
17226
웨이퍼 사이즈:
8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
17226
웨이퍼 사이즈:
8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Nanometrics Nanospec 4150 Film Thickness Measure환경 설정
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM 모델 설명
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.문서
문서 없음