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ONTO / NANOMETRICS / ACCENT / BIO-RAD NANOSPEC 6100
  • ONTO / NANOMETRICS / ACCENT / BIO-RAD NANOSPEC 6100
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OEM 모델 설명
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.
문서

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카테고리
Thin Film / Film Thickness

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

115126


웨이퍼 사이즈:

8"/200mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ONTO / NANOMETRICS / ACCENT / BIO-RAD

NANOSPEC 6100

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검증됨
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
listing-photo-0061da4d60054fec97f7920817e94d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/0061da4d60054fec97f7920817e94d75/c1bbf1298b8a44dcb30641e0163f9183_spk39100_mw.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

115126


웨이퍼 사이즈:

8"/200mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.
문서

문서 없음