We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
Thin Film Thickness Measurement환경 설정
환경 설정 없음OEM 모델 설명
The NanoSpec 9300 is a stand-alone, automated thin film measurement system that can handle both 200 and 300 millimeter diameter wafers. It can be configured with a DUV to NIR spectroscopic ellipsometer for ultrathin, multiple film stack, and DUV lithography measurement applications. Additionally, an FTIR option can be added to measure the thickness of epi-silicon. The system can also include a mini-environment enclosure and wafer load ports that are compatible with industry standards. The 9300 conforms to the new industry standards for 300 millimeter wafer handling automation and features a Windows NT software platform that conforms to the newly established SEMI user interface standard. The 9300 was developed using technologies from integrated film thickness systems, allowing for easy transfer of measurement recipes between integrated and stand-alone film metrology systems.문서
문서 없음
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
115101
웨이퍼 사이즈:
12"/300mm
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 9300
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
115101
웨이퍼 사이즈:
12"/300mm
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Thin Film Thickness Measurement환경 설정
환경 설정 없음OEM 모델 설명
The NanoSpec 9300 is a stand-alone, automated thin film measurement system that can handle both 200 and 300 millimeter diameter wafers. It can be configured with a DUV to NIR spectroscopic ellipsometer for ultrathin, multiple film stack, and DUV lithography measurement applications. Additionally, an FTIR option can be added to measure the thickness of epi-silicon. The system can also include a mini-environment enclosure and wafer load ports that are compatible with industry standards. The 9300 conforms to the new industry standards for 300 millimeter wafer handling automation and features a Windows NT software platform that conforms to the newly established SEMI user interface standard. The 9300 was developed using technologies from integrated film thickness systems, allowing for easy transfer of measurement recipes between integrated and stand-alone film metrology systems.문서
문서 없음