설명
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers환경 설정
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEM 모델 설명
미제공문서
문서 없음
N & K
8000-CD
검증됨
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
21701
웨이퍼 사이즈:
8"/200mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
N & K
8000-CD
카테고리
Thin Film / Film Thickness
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
21701
웨이퍼 사이즈:
8"/200mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers환경 설정
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEM 모델 설명
미제공문서
문서 없음