설명
Wafer Cleaner환경 설정
환경 설정 없음OEM 모델 설명
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.문서
문서 없음
ULTRA-T EQUIPMENT / UTE
SCSe124
검증됨
카테고리
Wafer Scrubber
마지막 검증일: 22일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113730
웨이퍼 사이즈:
6"/150mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULTRA-T EQUIPMENT / UTE
SCSe124
카테고리
Wafer Scrubber
마지막 검증일: 22일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
113730
웨이퍼 사이즈:
6"/150mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Wafer Cleaner환경 설정
환경 설정 없음OEM 모델 설명
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.문서
문서 없음