설명
Wet Bench Details Attached환경 설정
Tank 1: Recirc GAMA Module (SPM) Quartz Re-circulated Process Tank Sulfuric (H2SO4) Chemical Ratio: 9:1 Single HDPE Gravity Dispense Vessel for H2O2 (Using LE100 Level Sensors) Process Temperature: 90 - 150°C ± 2.0°C In-line Heater Bubbler Level Sensors 10:1 Dilution Drain Tank 2: Quick Dump Rinse Module (QDR) Tank 3: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1,100:2:1 and NH4OH only) In-line Heater - Process temperature – 40 – 60° C Tank 4: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1, 100:2:1 & NH4OH only) In-line Heater - Process temperature – 40 – 60° C Dryer: IPA Dryer Module PVDF Tank Assembly with Auto Lid Bulk Fill IPAOEM 모델 설명
The AKRION GAMA is a series of automated wet stations that are flexible and modular. They are suitable for a wide variety of cleaning, etching and stripping applications for bare and reclaimed silicon wafers, IC devices, MEMS and photomasks. The GAMA series is designed to provide high throughput and precision cleaning for semiconductor manufacturing processes.문서
AKRION
GAMA
카테고리
Wet Benches - Auto
마지막 검증일: 오늘
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
148616
웨이퍼 사이즈:
알 수 없음
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available