설명
Batch Wafer Processing환경 설정
환경 설정 없음OEM 모델 설명
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.문서
문서 없음
TEL / TOKYO ELECTRON
UW-200Z
검증됨
카테고리
Wet Benches - Auto
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
52997
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
UW-200Z
카테고리
Wet Benches - Auto
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
52997
웨이퍼 사이즈:
8"/200mm
빈티지:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Batch Wafer Processing환경 설정
환경 설정 없음OEM 모델 설명
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.문서
문서 없음