설명
설명 없음환경 설정
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 모델 설명
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.문서
문서 없음
SEMITOOL
SAT
검증됨
카테고리
Wet processing
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
39654
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기SEMITOOL
SAT
검증됨
카테고리
Wet processing
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
39654
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 모델 설명
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.문서
문서 없음