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AXCELIS / FUSION FUSION ES3
    설명
    DRY ETCH
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
    문서

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    카테고리
    Ashers / Plasma Cleaner

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    61228


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    AXCELIS / FUSION

    FUSION ES3

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    검증됨
    카테고리
    Ashers / Plasma Cleaner
    마지막 검증일: 60일 이상 전
    listing-photo-410ee2bab5a847f1a43f051b2cd54d4a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    61228


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    DRY ETCH
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
    문서

    문서 없음