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AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
설명
ETCH
환경 설정
환경 설정 없음
OEM 모델 설명
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
문서

문서 없음

카테고리
Ashers / Plasma Cleaner

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

47118


웨이퍼 사이즈:

12"/300mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AXCELIS / FUSION

FUSION ES3

verified-listing-icon
검증됨
카테고리
Ashers / Plasma Cleaner
마지막 검증일: 60일 이상 전
listing-photo-92f236c5e84a4e2e914fe18c8b6c73f8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

47118


웨이퍼 사이즈:

12"/300mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ETCH
환경 설정
환경 설정 없음
OEM 모델 설명
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
문서

문서 없음